Parallel beam etching, assisted deposition, sputtering.
10eV-1keV
As there are now many manufacturers of stand alone power supplies we now offer these high performance sources without power supplies
The DC filament-driven ion sources are an extension to the highly successful family of atom sources from Oxford Applied Research. They have been extensively developed with simple operation and servicing in mind. The flange mount sources are UHV compatible and primarily for use with argon. They are highly suited for applications such as ion-beam assisted deposition (IBAD), sputter deposition, etching, and substrate cleaning.
A high-transparency grid-set is used to extract ions from the plasma, resulting in a high beam current density and excellent beam profiles.
Compatible gases
In addition to inert gases, the sources can also be used with O , N and H
Beam profile
The sources can be equipped with a variety of grids, to tailor the beam profile to a particular application. For example, convex grids can be used for irradiation of large areas with high uniformity. Concave grids can be employed to focus the beam for applications where very high current-density is required, such as sputter deposition.
Beam Neutralisation
Ion impingement on insulating surfaces leads to a rapid build-up of charge, ultimately retarding the ion beam. This is overcome by injecting electrons into the ion beam to neutralise it. We offer plasma bridge neutraliser and filament-based electron injection sources. Both can be supplied for prolonged use with reactive gases.
