Home About Us News Conferences Contact Technical Support Products.... Integrated glovebox Valved RF crackers Valved Organic Evaporators Nanocluster solutions Mini e-beam evaporators Thermal gas crackers RF atom sources RF ion sources DC ion sources Low energy ion sources Ion milling systems Ionised beam K-cells Mini ion guns Compound dissociation K-cell Gas dosers
	NEWS !!!!WE CURRENTLY HAVE A VACANCY FOR AN ELECTRONICS DESIGN ENGINEER!!!! Oxford Applied Research Ltd Nanotech House Nursery Road North Leigh Business Park Witney, Oxfordshire United Kingdom OX29 6SN TEL +44 (0)1993 880005 FAX +44 (0)1993 880060 Dual Ion Beam System Iondep250 This system comprises mainly of two RF ion sources, RF50, with different grid configurations, for the use of milling/etching and deposition purposes. Dual Nanocluster Source - Nanodep60 This new dual-nanocluster source system is designed for simultaneous co-deposition of mass-filtered nanoclusters of two different materials. OAR Nanocluster Source at Diamond Synchrotron UK OAR nanocluster source has been used at Diamond Synchrotron UK. The source was coupled to the 106 nanostructures beamline at Diamond. The source was used by Prof. Chris Binns (Leicester University); for gas-phase nanodeposition into liquid.
Last updated: 23rd July 2010 Copyright 2008 The Vacutec Group Home About Us News Conferences Contact Technical Support