COMPLETE MBE & UHV SYSTEMS
MBE/UHV Components
MBE/UHV Components
RF Atom Sources
Radio frequency plasma sources for generating highly reactive atomic species including hydrogen, nitrogen, and oxygen. Essential for nitride and oxide growth in MBE systems, providing consistent atomic flux with minimal ion content.
Key Features:
- •High atomic flux generation
- •Multiple gas compatibility
- •Low ion content output
- •Stable plasma operation
- •UHV compatible design
MBE/UHV Components
Piezo-electric Gas Doser
Precision gas injection system utilizing piezo-electric control for ultra-precise gas dosing in UHV environments. Ideal for controlled atmosphere studies, reactive deposition, and gas-surface interaction research.
Key Features:
- •Precise gas flow control
- •Fast response time
- •Wide pressure range
- •Bakeable construction
- •Multiple gas channels available
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